Fri Frakt över 299kr
Fri Frakt över 299kr
Kundservice
Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics: Volume 612

Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics: Volume 612

403 kr

403 kr

I lager

Ons, 9 jul - tis, 15 jul


Säker betalning

14-dagars öppet köp


Säljs och levereras av

Adlibris

Produktbeskrivning

This book highlights important achievements and challenges in advanced interconnects and low-k dielectrics as employed in the microelectronics industry. The replacement of Al alloys with Cu along with the introduction of new barrier materials to protect Cu from chemical attack, and the utilization of new dielectric materials with a lower relative dielectric constant k than SiO2 in multilevel metallization structures of increasing complexity, are the major themes of evolution in this field. Invited reviews illustrate the significant progress that has been achieved as well as the challenges that remain. Contributed papers presented by researchers from different countries demonstrate progress on current topics using a truly multidisciplinary approach.

Artikel.nr.

c1dd8004-0eef-57d9-ad10-2c9524a50db8

Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics: Volume 612

403 kr

403 kr

I lager

Ons, 9 jul - tis, 15 jul


Säker betalning

14-dagars öppet köp


Säljs och levereras av

Adlibris